Our research group received funding of $4.2M over three years from the Department of Energy (DOE) to explore magnetic materials for quantum information systems. Magnons, the fundamental excitations of magnetically ordered systems, have inherent chiral properties, which can give rise to non-reciprocal behavior. In other words, magnetic materials may provide one-way streets for quantum information, which may be useful to reduce unwanted noise and therefore may enhance the efficiencies of quantum computers. This project is a broad collaboration that includes additional research groups at UIUC (Pfaff, Schleife, and Zuo), as well as researchers at Argonne National Laboratory (Li and Novosad). More information can be found here.
D. D. Awschalom, C. H. R. Du, R. He, F. J. Heremans, A. Hoffmann, J. T. Hou, H. Kurebayashi, Y. Li, L. Liu, V. Novosad, J. Sklenar, S. E. Sullivan, D. Sun, H. Tang, V. Tiberkevich, C. Trevillian, A. W. Tsen, L. R. Weiss, W. Zhang, X. Zhang, L. Zhao, and C. W. Zollitsch,
IEEE Transactions on Quantum Engineering 2, 5500836 (2021).
M. S. El Hadri, J. Gibbons, Y. Xiao, H. Ren, H. Arava, Y. Liu, Z. Liu, A. Petford-Long, A. Hoffmann, and E. E. Fullerton,
Physical Review Materials 5, 064410 (2021).
S. A. Siddiqui, D. Hong, J. E. Pearson, and A. Hoffmann,
Coatings 11, 786 (2021).
Q. Shao, P. Li, L. Liu, H. Yang, S. Fukami, A. Razavi, H. Wu, K. L. Wang, F. Freimuth, Y. Mokrousov, M. D. Stiles, S. Emori, A. Hoffmann, J. Åkerman, K. Roy, J.-P. Wang, S.-H. Yang, K. Garello, and W. Zhang,
IEEE Transactions on Magnetics 57, 800439 (2021).
Our recent research article “Proximity-induced anisotropic magnetoresistance in magnetized topological insulators” was featured by Applied Physics Letters. This article discusses the magnetoresistance in bilayers of topological insulators (Bi2Se3) and ferrimagnetic insulator (Y3Fe5O12; YIG). We observe that the orientation of the magnetization YIG controls the magnitude of the gap in the electronic band structure of the adjacent topological insulator.
J. Sklenar, Y. Zhang, M. B. Jungfleisch, Y. Kim, Y. Xiao, G. J. MacDougall, M. J. Gilbert, A. Hoffmann, P. Schiffer, and N. Mason,
Applied Physics Letters 118, 232402 (2021).
Y. Li, C. Zhao, W. Zhang, A. Hoffmann, and V. Novosad,
APL Materials 9, 060902 (2021).
Y. Li, C. Zhao, V. P. Amin, Z. Zhang, M. Vogel, Y. Xiong, J. Sklenar, R. Divan, J. Pearson, M. D. Stiles, W. Zhang, A. Hoffmann, and V. Novosad,
Applied Physics Letters 118, 202403 (2021).